Canon, known for their printers and cameras is looking to be suiting up to introduce a new class of low-cost nanoimprint lithography (NIL) machines to make their mark in the semiconductor industry. Targeting a launch as early as this year, Canon’s NIL technology presents a radical departure from the conventional, more intricate light-based etching processes epitomized by ASML, the current unchallenged market leader in semiconductor lithography who supplies both Intel and TSMC to name a few for their chipmaking toys.
Canon’s NIL approach, which physically stamps chip designs onto silicon wafers, is poised to not only undercut its competitors on price but also democratize access to leading-edge chip production capabilities. Hiroaki Takeishi, the head of Canon’s industrial group overseeing the development of nanoimprint lithography, highlighted the company’s ambition to commence shipments “this year or next year,” leveraging the market’s robust demand. Takeishi emphasized the uniqueness and simplicity of the NIL technology, which promises to facilitate the production of cutting-edge chips at significantly reduced costs.
Aiming initially at semiconductor nodes of 5 nanometers with aspirations to scale down to 2 nanometers, Canon’s NIL machines are on the brink of overcoming the defect rate challenges that previously plagued this technology. The success of this endeavor, however, hinges on Canon’s ability to persuade the industry that integrating these new machines into existing fabrication ecosystems is both feasible and beneficial.
Despite the optimism surrounding Canon’s entry into the market, there remains a degree of skepticism regarding its potential to disrupt a sector dominated by ASML‘s advanced and costly extreme ultraviolet (EUV) lithography tools. Nevertheless, with nanoimprint technology promising yields nearing 90% at a fraction of the cost and energy consumption of EUV systems, Canon could indeed carve a niche for itself. The company claims that its NIL machines cost only 40% of what ASML’s machinery does, while operating with up to 90% less power.
Canon’s strategic focus is initially set on the production of 3D NAND memory chips, a choice that steers clear of the complexities involved in processor manufacturing. However, Canon’s ambitions face regulatory hurdles, particularly export controls that restrict sales to China. Despite these challenges, Takeishi assures that Canon is navigating the sanctions landscape with due diligence.
After over fifteen years of development, the commercial deployment of Canon’s nanoimprint lithography machines could catalyze a shift in the competitive dynamics of semiconductor manufacturing. By enabling new entrants to produce advanced semiconductors more affordably, Canon’s technology has the potential to redefine industry benchmarks. Yet, the long-term impact of Canon’s NIL machines will depend on overcoming operational defect rates, integration challenges, and geopolitical constraints. The semiconductor industry waits with bated breath to see if Canon can indeed disrupt the market and alter the course of chipmaking technology.